<?xml version="1.0" encoding="UTF-8"?>
		<www.jsetms.com>
		<Title>Designing Thin Film for Wavelength Division Multiplexing</Title>
		<Author>Madhavi Latha</Author>
		<Volume>01</Volume>
		<Issue>01</Issue>
		<Abstract>There are two designs of thin film narrow bandpass filters with several cavities These filters which are the most used filtering technologies have been crucial to the advancement of technology in contemporary optical communication systems This work focusses on a theoretical investigation of optoelectronics physics which is primarily connected to the design and analysis of this kind of filter The technology of thin film multicavity filters is briefly introduced Well cover some recent developments in thinfilm multicavity technology design TiO2 and SiO2 are the two materials used in these designs as high and low index The three and four wavelengths 730800 and additionally 835432560 and 774 nm can be detected by these wavelengths which range from 600 to 900 nm The filters function is to filter fused silica with index 423</Abstract>
		<permissions>
<copyright-statement>Copyright (c) Journal of Science Engineering Technology and Management Science. All rights reserved</copyright-statement>
<copyright-year>2026</copyright-year>
</permissions>
		</www.jsetms.com>
		